Photo of AJA Orion Sputter System
AJA Orion Sputter System can be used to deposit transparent conductive oxide thin films over a substrate up to 6” in diameter. It is fitted with five 3” diameter sputter guns that are powered by RF, DC, and pulse sources and can be used for single or multi-layer deposition. The substrate heating, rotation, and RF biasing is available. Argon, Nitrogen and Oxygen are available for use in sputtering depositions.
Photo of an 80nm ITO film on glass<br />

80nm ITO film on glass
Surface Roughness: 0.38 nm